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| Mechanical Behavior | Standard Values |
|---|---|
| Density | 2.2 g/cm³ |
| Compressive Strength | 1100 MPa High |
| Flexural Strength | 67 MPa |
| Poisson's Ratio | 0.14 ~ 0.17 |
| Young's Modulus | 72,000 MPa |
| Modulus of Rigidity | 31,000 MPa |
| Mohs Hardness | 5.5 ~ 6.5 |
| Transformation Point | 1280 °C |
| Softening Point | 1780 °C Ultra-High |
| Annealing Point | 1250 °C |
| Specific Heat (20 ~ 350 °C) | 670 J/kg·°C |
| Thermal Conductivity (20 °C) | 1.4 W/m·°C |
| Index of Refraction | 1.4585 |
| Low Thermal Expansion Coefficient | 5.5 × 10⁻⁷ cm/cm·°C |
| Thermal Processing Temperature | 1750 ~ 2050 °C |
| Short-Term Use Temperature | 1300 °C |
| Long-Term Use Temperature | 1100 °C |
| Material | Silicon Dioxide (Natural Quartz) |
| Color | Transparent or Colorless |
| Surface | No Air Bubble, No Line |
| Strain | 1270°C Fused Quartz Glass Brick |
| PPM Grade | Controlled 10 / 20 / 100 PPM |
| Shape | Circle |
| Thickness | 2 mm – 20 mm |
This quartz glass can withstand a short-term use temperature of up to 1300 °C and a long-term use temperature of up to 1100 °C, making it highly suitable for demanding high-temperature industrial applications.
The quartz glass is manufactured from Silicon Dioxide (SiO₂) derived from natural quartz, ensuring high purity and excellent optical and thermal performance.
The quartz glass is available in thicknesses ranging from 2 mm to 20 mm, offering flexibility for various engineering and optical system requirements.
The quartz glass is available in controlled purity grades of 10 PPM, 20 PPM, and 100 PPM, allowing customers to select the appropriate purity level based on their specific application needs.
The extremely low thermal expansion coefficient of 5.5 × 10⁻⁷ cm/cm·°C means the quartz glass experiences minimal dimensional change under temperature fluctuations, making it ideal for precision optical components, laboratory equipment, and semiconductor manufacturing environments.
Yes. The quartz glass is manufactured to strict quality standards, ensuring a surface free of air bubbles and lines, which is critical for applications requiring high optical clarity and structural integrity.
