Explore our verified high-temperature resistant and chemically inert components, fabricated to micro-metric precision for advanced laboratory and cleanroom integration.
A Laboratory Quartz Plate (fused silica window/substrate) serves as a mission-critical baseline across contemporary experimental physics, wafer-level processing, and biochemical diagnostics. Engineered from amorphous silicon dioxide (SiO₂ purity ≥ 99.99%), these plates are chosen when borosilicate, aluminosilicate, and soda-lime glass fail under thermal fatigue, extreme UV attenuation, or chemical dissolution.
| Material Parameter | JGS1 (Synthetic Fused Silica) | JGS2 (Fused Quartz / Optical Grade) | JGS3 (Infrared Fused Silica) |
|---|---|---|---|
| Primary Spectral Window | Deep UV to Visible (185 nm – 2500 nm) | UV to Near-IR (220 nm – 2500 nm) | Visible to Far-IR (260 nm – 3500 nm) |
| Hydroxyl [OH⁻] Content | High (> 1200 ppm) | Intermediate (150 – 300 ppm) | Ultra-Low (< 5 ppm) |
| Absorption Bands | No 248 nm / 193 nm color centers | Slight absorption at 240 nm band | No absorption valley at 2.73 μm |
| Dominant Laboratory Use | Deep-UV Excitation, Microfluidics | Substrate Windows, Furnace Viewports | FTIR Spectrometry, IR Thermal Curing |
As wafer foundries scale beyond 3 nm nodes and green hydrogen electrolyzers demand extreme thermal durability, global procurement teams face chronic shortages of high-purity quartzware. Here is how modern manufacturing ecosystems mitigate vulnerability.
Located in Donghai County, Jiangsu—the premier silica hub of Eurasia—our supply network connects refined quartz feedstock directly to multi-axis CNC cold processing and high-temperature flame fusion within an 8-kilometer radius, slashing raw material transit lag to near zero.
Unlike Western suppliers bound to 16-week lead times for customized furnace fixtures and quartz plates, Southeast Quartz operates proprietary CNC diamond grinding centers capable of turning technical drawings into functional prototypes in 5 to 7 business days.
Every laboratory quartz plate undergoes helium mass-spectrometry leak detection, Zygo interferometric flatness verification (λ/4 to λ/10 per inch), and acid-bath degreasing inside class-10,000 cleanrooms before multi-layer vacuum shockproof export crating.
Precision quartz plates are not commodity items; their physical parameters dictate the signal-to-noise ratio in analytical instruments and wafer yield rates in vacuum chambers.
High mechanical parallelism and low bubble inclusion grades (DIN 58927 Class 0) allow our quartz plates to serve as photolithographic mask blanks and laser optical inspection windows where optical distortion must be zero.
Unreactive against aqua regia, concentrated sulfuric acid, and halogen gas atmospheres up to 1,000 °C. Used extensively as bottom carrier plates in tube furnaces and chemical vapor deposition (CVD) reaction chambers.
Engineered for minimal internal scattering and zero luminescence under 254 nm and 365 nm irradiation. Essential for quantitative analytical chemistry in academic laboratories and pharmaceutical development.
With volume resistivity greater than 10¹⁸ Ω·cm at room temperature and a low dielectric loss factor across high radio frequencies, our quartz plates serve as RF windows and plasma chamber dielectric isolation barriers.
As industry requirements push toward sub-nanometer surface roughness (Ra < 0.5 nm) and oversized monolithic form factors, Southeast Quartz continues to invest across four production frontiers.
Shifting from traditional oxy-hydrogen arc fusion toward vacuum plasma chemical vapor deposition (V-PCVD), reducing trace metallic impurities below 5 ppb for next-gen semiconductor cleanroom substrates.
Implementing deterministic magnetorheological polishing to eliminate subsurface micro-cracks, achieving surface roughness Ra ≤ 0.3 nm and wave-front distortion < λ/10 for quantum computing viewports.
Deploying diamond wire multi-slicing systems able to slice 1,200 mm × 1,200 mm monolithic quartz plates with thickness variations within ± 0.02 mm, satisfying the generation-10.5 display glass mask criteria.
In-house electron-beam evaporator integration providing anti-reflective (BBAR) and conductive ITO thin films engineered to survive 400 °C bake-outs without delamination or optical degradation.
International procurement requires rock-solid documentation. We provide complete material certification and audit readiness with every commercial shipment.
Every delivery includes batch ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry) elemental impurity profiles and UV-Vis-NIR spectrophotometer transmission curves from 190 nm to 3,000 nm.
Our fused silica components are certified non-hazardous under EU RoHS Directive 2011/65/EU and REACH (EC 1907/2006). Feedstocks are sourced exclusively from compliant and audited supply networks.
Plates are wrapped in lint-free cleanroom paper, encapsulated in static-dissipative sealed PE bags, stabilized inside custom CNC-cut polyethylene high-density foam, and housed in ISPM-15 export-certified timber crates.
Direct answers to common engineering questions regarding devitrification, tolerances, surface finishing, and material selection.
Complementary high-purity components manufactured to exact customer specifications in our Donghai processing facility.
