Precision-engineered high-temperature fused silica and quartz research plates, diffusion chambers, and custom thermal tooling fabricated to sub-micron tolerances for global cleanrooms and research institutes.
Evaluating crystallographic purity, OH⁻ hydroxyl absorption spectra, thermal shock limits, and chemical resilience across ultra-clean laboratory environments.
Derived from plasma-fused silicon tetrachloride precursors or high-grade Donghai crystalline rock, our research plates eliminate trace element migration. Transition metal contamination (Fe, Cu, Ni, Cr) is constrained below 0.1 ppm to prevent spurious catalytic interference during laser spectroscopy and atomic layer deposition (ALD).
With a coefficient of thermal expansion (CTE) of approximately 5.5 × 10⁻⁷ / K, quartz research plates withstand brutal thermal cycling. Discs can be quenched from 1,150°C directly into ice-cold water without micro-fracturing, providing unprecedented structural integrity inside rapid thermal processing (RTP) chambers.
Precision-polished synthetic silica research plates feature deep UV cutoff down to 185 nm with >90% internal transmittance at 260 nm (JGS1 synthetic standard), eliminating solarization degradation and offering flawless photon throughput for Raman spectroscopy, excimer laser ablation, and UV photolithography.
Evaluating mechanical, thermal, and optical benchmarks between JGS1, JGS2, and JGS3 quartz plates to align with specific procurement and engineering requirements.
| Performance Parameter | JGS1 (Synthetic Fused Silica) | JGS2 (Fused Quartz Plate) | JGS3 (Infrared Optical Quartz) | ASTM / SEMI Benchmark |
|---|---|---|---|---|
| Spectral Range | 185 nm – 2,500 nm (Deep UV to VIS) | 220 nm – 2,500 nm (Standard Optical) | 260 nm – 3,500 nm (Extended IR) | SEMI M18 / ISO 10110 |
| OH⁻ Content (PPM) | < 5 ppm – 1,200 ppm (Grade Tuned) | 150 ppm – 200 ppm (Typical) | < 5 ppm (Anhydrous IR Grade) | DIN 58927 Spectral Analysis |
| Softening Point | 1,730°C | 1,683°C | 1,700°C | ASTM C338-93 |
| Annealing Point | 1,180°C | 1,215°C | 1,160°C | ASTM C336 |
| Refractive Index (nd @ 589.3nm) | 1.4585 ± 0.0001 | 1.4584 ± 0.0002 | 1.4585 ± 0.0001 | ISO 489 Precise Refractometry |
| Standard Surface Quality | 20/10 Scratch-Dig, Ra < 0.3 nm | 40/20 Scratch-Dig, Ra < 0.8 nm | 60/40 Scratch-Dig, Ra < 1.2 nm | MIL-PRF-13830B Standards |
From EUV semiconductor clusters in East Asia to bio-analytical microfluidic labs in North America and laser research institutes in Western Europe.
Precision quartz research plates serve as critical structural carriers and electrostatic chuck dielectric covers in wafer thin-film deposition (CVD, PVD), etch processing, and high-temperature diffusion furnaces. With near-zero alkali metal outgassing, our plates eliminate lattice defects in 300mm silicon and compound semiconductor (SiC, GaN) epitaxy.
Featuring laser-induced damage thresholds (LIDT) exceeding 15 J/cm² at 1,064 nm (20 ns pulse), our polished fused silica plates are employed by university photonics laboratories and industrial cutting-head manufacturers as debris shields, Brewster angle windows, and polarizing substrate plates.
For genome sequencing, single-cell analysis, and fluorescence detection, optical quartz plates provide non-fluorescing, chemically unreactive backbones. Sub-micron laser-etched microchannels bonded between dual fused silica plates ensure repeatable fluidic dynamic behavior without protein adhesion.
Architecting structural quartzware to satisfy emerging demands in Quantum Computing, Extreme Ultraviolet (EUV) Lithography, and Advanced Packaging.
Deploying Magnetorheological Finishing (MRF) and ion-beam figuring (IBF) across our cold-machining facilities. This breakthrough enables ultra-flat quartz substrates exhibiting peak-to-valley variations under 30 nm across a 400 mm span, vital for next-gen EUV photomask blanks and astronomical mirrors.
Integrating titanium dioxide (TiO₂) nanocrystalline doping to fabricate Ultra-Low Expansion (ULE) quartz glass with a near-zero CTE between 5°C and 35°C. This guarantees absolute dimensional rigidity in cryogenic quantum processing units (QPUs) and orbital satellite optical payloads.
Fusing femtosecond laser-assisted chemical etching (FLICE) with atmospheric direct bonding to build monolithic multi-tier 3D quartz reactors without adhesive interfaces. These structures tolerate operating pressures >100 bar for continuous flow micro-synthesis under superheated conditions.
Leveraging the world's most concentrated silicon refining, ingot melting, and automated cold-working ecosystem in Donghai, Jiangsu Province.
Positioned at the epicenter of China's quartz refining corridor, our manufacturing base maintains strategic stockpiles of ultra-pure silica sand and plasma-melted billets. This insulation protects international clients from sudden raw material shortages, offering reliable pricing stability through volatile commodity cycles.
With an in-house tooling workshop, multi-axis ultrasonic CNC milling centers, and specialized glass lathe stations, custom research plate prototypes shift from CAD STEP drawings to first-article inspection (FAI) in as little as 5 to 7 business days, shortening R&D launch timelines.
Total Cost of Ownership (TCO) is optimized by combining direct manufacturing pricing with rigorous export packaging standards (Class 10,000 cleanroom nitrogen-purged hermetic vacuum sealing, suspended inner carton cradles, and heavy wooden ocean-safe crates).
Rigorous international compliance aligned with ISO 9001, RoHS, REACH, and SEMI manufacturing directives.
Critical vacuum flanges, bonded research plates, and flanged reaction cells are tested via Pfeiffer helium mass-spectrometer leak detectors. Our benchmark exceeds 1 × 10⁻¹⁰ mbar·L/s, guaranteeing zero virtual leaks within ultra-high vacuum (UHV) thin-film sputtering chambers.
Every batch of optical quartz plates undergoes laser Fizeau interferometry (Zygo Verifire™) to certify wavefront distortion, surface parallelism (< 10 arcseconds), and residual stress birefringence (< 5 nm/cm), preventing polarization distortion in sensitive optical sensors.
Supplied with raw-material ingot certificates, glow discharge mass spectrometry (GDMS) assay sheets, and UV-Vis-NIR spectrophotometer transmission curves, delivering transparent chain-of-custody documentation required by defense, aerospace, and medical device buyers.
Clear, engineer-level answers addressing devitrification risks, thermal tolerances, synthetic quartz differences, and procurement lead times.
Natural fused quartz is produced by electrically melting naturally occurring crystalline quartz rock. While chemically pure (>99.99% SiO₂), it retains minor trace metallic impurities (Al, Fe, Ti) and minor micro-bubbles. Synthetic fused silica is created via the gas-phase chemical synthesis of silicon tetrachloride (SiCl₄) in an oxygen-hydrogen flame. This results in virtually 100% bubble-free amorphous material with total metallic impurities below 0.1 ppm and exceptional deep-UV transmission down to 185 nm.
Devitrification (re-crystallization from amorphous SiO₂ to cristobalite) occurs rapidly above 1,150°C when surface alkali contaminants (sodium, potassium, calcium) are present. To prevent devitrification, clean quartz research plates using a 5–10% hydrofluoric (HF) acid bath, rinse thoroughly with high-resistivity deionized water, dry in a clean nitrogen stream, and handle exclusively with lint-free cleanroom gloves prior to insertion into the thermal chamber.
Using temperature-regulated ultrasonic 5-axis CNC machining, edge grinding, and double-sided planetary polishing, standard tolerances are held to ±0.05 mm on length and width, ±0.02 mm on thickness, with custom optical-grade tolerances achievable down to ±0.005 mm. Chamfering, stepped shoulders, countersunk holes, and precision-ground slots are fully verified via our automated coordinate measuring machines (CMM).
Every quartz plate undergoes automated ultrasonic cleaning, is individually sealed in static-free vacuum barrier packaging inside a Class 10,000 cleanroom, and is cushioned by precision-cut high-density closed-cell polyethylene foam. Shipments are packed in impact-rated double-wall multi-ply wooden export crates fitted with real-time 3D shock indicators and tilt monitors.
Explore our full line of laboratory rods, furnace process tubes, precision microchannel flow cells, and slotted wafer carriers manufactured in Donghai, Jiangsu.
